聚氨酯拋光皮

聚氨酯拋光皮主要應用於玻璃、晶體、金屬類…等光電元件的拋光，使用時需搭配不同的拋光液，此類拋光皮依照所含的研磨材料，可區分為氧化鈰拋光皮(PC)、氧化鋯拋光皮(PZ)、氧化鋁拋光皮(PA)及純聚氨酯皮(PU)。拋光皮可依照加工物之不同設計出不同的開溝尺寸，並可結合不同厚度的EVA，以增加拋光時的涵蓋率。

Polyurethane polishing pads are primarily used for polishing optical components such as glass, crystals, and metals. When in use, they must be paired with various types of polishing slurry. These polishing pads can be categorized based on the abrasive materials they contain: cerium oxide polishing pad (PC), zirconium oxide polishing pad (PZ), aluminum oxide polishing pad (PA), and pure polyurethane pad (PU). The groove patterns on the pads can be customized according to the specific workpiece being processed. Additionally, different thicknesses of EVA can be combined with the pads to enhance surface conformity during polishing.